Faci­li­ties ava­ila­ble in Depart­ment of Pho­to­nics allow for rese­arch, deve­lop­ment and testing of struc­tu­res and semi­con­duc­tor devi­ces based on AIII-BV com­po­unds. We pro­vide servi­ces asso­cia­ted to each stage of the device fabri­ca­tion:

  • design and simu­la­tion of pho­to­nic devi­ces using advan­ced com­pu­ta­tio­nal tools (Matlab, PICS3D and APSYS com­pany Cros­sligh, FIMMWAVE Pho­ton Design)
  • depo­si­tion of AIII-BV hete­ro­struc­tu­res by means of mole­cu­lar beam epi­taxy tech­ni­que (two reac­tors of Riber: 32p and Com­pact 21T)
  • post-growing cha­rac­te­ri­sa­tion of epi­ta­xial struc­tu­res
  • high-resolution X-ray measu­re­ments
  • spatially-resolved spec­tro­sco­pic measu­re­ments (pho­to­lu­mi­ne­scence, reflec­tance)
  • high reso­lu­tion spec­tro­sco­pic measu­re­ments (micro­pho­to­lu­mi­ne­scence, micro­re­flec­tance)
  • elec­tri­cal measu­re­ments (Hall effect)
  • pro­ces­sing tech­no­logy (poli­shing, pho­to­li­tho­gra­phy, oxy­gen and pla­sma etching, depo­si­tion of metal and elec­tric lay­ers)
  • device assem­bling (sol­de­ring, bon­ding, laser che­aps pac­ka­ging)
  • post-mounting cha­rac­te­ri­za­tion of the device and deter­mi­na­tion of its ope­ra­ting con­di­tions (I-V, I-P cha­rac­te­ri­stics)
  • geo­me­tric and spec­tral cha­rac­te­ri­za­tion of laser radia­tion
  • ther­mal testing of lasers (ther­mo­re­flec­tance measu­re­ments)



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